دانلود کتاب Advanced Gate Stacks for High-Mobility Semiconductors (Springer Series in Advanced Microelectronics)

فهرست مطالب :

Front Matter....Pages I-XXII
Strained-Si CMOS Technology....Pages 1-19
High Current Drivability MOSFET Fabricated on Si(110) Surface....Pages 21-41
Advanced High-Mobility Semiconductor-on-Insulator Materials....Pages 43-72
Passivation and Characterization of Germanium Surfaces....Pages 73-113
Interface Engineering for High-κ Ge MOSFETs....Pages 115-138
Effect of Surface Nitridation on the Electrical Characteristics of Germanium High-κ/Metal Gate Metal-Oxide-Semiconductor Devices....Pages 139-164
Modeling of Growth of High-κ Oxides on Semiconductors....Pages 165-179
Physical, Chemical, and Electrical Characterization of High-κ Dielectrics on Ge and GaAs....Pages 181-209
Point Defects in Stacks of High-κ Metal Oxides on Ge: Contrast with the Si Case....Pages 211-228
High κ Gate Dielectrics for Compound Semiconductors....Pages 229-256
Interface Properties of High-κ Dielectrics on Germanium....Pages 257-267
A Theoretical View on the Dielectric Properties of Crystalline and Amorphous High-κ Materials and Films....Pages 269-292
Germanium Nanodevices and Technology....Pages 293-313
Opportunities and Challenges of Germanium Channel MOSFETs....Pages 315-332
Germanium Deep-Submicron p -FET and n -FET Devices, Fabricated on Germanium-On-Insulator Substrates....Pages 333-340
Processing and Characterization of III–V Compound Semiconductor MOSFETs Using Atomic Layer Deposited Gate Dielectrics....Pages 341-361
Fabrication of MBE High-κ MOSFETs in a Standard CMOS Flow....Pages 363-374
Back Matter....Pages 375-383